Products / #104961

Centella Repairing Clay Mask

Skin Ever · Face Mask
💡 For reference only. Does not constitute medical advice. Please refer to the actual product packaging.
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Centella Repairing Clay Mask
Description
Skin Ever Centella Repairing Clay Mask ingredients explained: Aqua, Kaolin, Ethylhexyl Palmitate, Propylene Glycol, Glycerin, Cetearyl Alcohol, Dimethicone, Polysorbate 60, Sorbitan Stearate, Glyceryl Stearate, PEG-100 Stearate, Chamomilla Recutita (Matricaria) Flower Extract, Malva Sylvestris (Mallow) Flower Extract, Paeonia Lactiflora Root Extract, Lonicera Japonica (Honeysuckle) Flower Extract, Taraxacum Officinale (Dandelion) Rhizome/Root Extract, Viola Yedoensis Extract, Centella Asiatica Extract, Bisabolol, Xanthan Gum, Phenoxyethanol, Methylparaben, Propylparaben, Chlorphenesin, Parfum, Ci 77288
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Category: Face Mask
Created: 2026-03-29 21:31:28.831768+00:00
Default volume:
GB Retailer 26 ingredients
Last verified: 2026-03-29 link #1578858

Ingredients

# INCI
1 Water (Aqua)
2 Kaolin
3 Ethylhexyl Palmitate
4 Propylene Glycol
5 GLYCERIN (Glycerin)
6 Cetearyl Alcohol
7 Dimethicone
8 Polysorbate 60
9 Sorbitan Stearate
10 Glyceryl Stearate
11 PEG-100 Stearate
12 Chamomilla Recutita (Matricaria) Flower Extract
13 Malva Sylvestris (Mallow) Flower Extract
14 Paeonia Lactiflora Root Extract
15 Lonicera Japonica (Honeysuckle) Flower Extract
16 Taraxacum Officinale (Dandelion) Rhizome/Root Extract
17 Viola Yedoensis Extract
18 Centella Asiatica Extract
19 Bisabolol 可能引起皮膚過敏
20 Xanthan Gum
21 Phenoxyethanol 嚴重眼損傷 可能刺激呼吸道
22 Methylparaben 皮膚刺激 眼部刺激 可能刺激呼吸道
23 Propylparaben 皮膚刺激 可能引起皮膚過敏 眼部刺激 可能刺激呼吸道
24 Chlorphenesin 皮膚刺激 嚴重眼損傷 眼部刺激 可能刺激呼吸道
25 PARFUM (Parfum)
26 Ci 77288 可能引起皮膚過敏 眼部刺激 可能引起呼吸道過敏