Ha Plant Extract Moisturising Mask

Genuine Namir Ha Plant Extract Moisturising Mask ingredients explained: Water, Propanediol, Glycerin, Sodium Hyaluronate, Hydrolyzed Sodium Hyaluronate, Saccharide Isomerate, Dipotassium Glycyrrhizate, Arginine, Phaseolus Radiatus Seed Extract, Hippophae Rhamnoides Extract, Hibiscus Mutabilis Flower Extract, Bis-PEG-15 Methyl Ether Dimethicone, Propanediol, Betaine, Glycereth-26, Raffinose, Glucose, Butylene Glycol, Caprylic/Capric Triglyceride, PEG-20 Hydrogenated Castor Oil, Sorbitan Oleate, Squalane, Carthamus Tinctorius (Safflower) Seed Oil, Oxidized Corn Oil, Glyceryl Caprylate, Lauryl Glucoside, Pyrus Malus (Apple) Seed Extract, Olea Europaea (Olive) Fruit Oil, Simmondsia Chinensis (Jojoba) Seed Extract, Tocopherol, Helianthus Annuus (Sunflower) Seed Oil, Hydroxyethylcellulose, Carbomer, Sodium Polyacrylate, Glyceryl Caprylate, Caprylhydroxamic Acid, Caprylyl Glycol, Hydroxyacetophenone, Disodium EDTA